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Title:
TUNNEL MAGNETORESISTIVE ELEMENT MANUFACTURING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2014/024358
Kind Code:
A1
Abstract:
The present invention provides a TMR element manufacturing apparatus which is capable of reducing the contamination of a magnetic film with impurities. A tunnel magnetoresistive element manufacturing apparatus according to one embodiment of the present invention is provided with: a load lock apparatus for carrying substrates to and from the outside; a first substrate transfer apparatus, which is connected to the load lock apparatus, and which has at least one substrate processing apparatus connected thereto; a first air-releasing section that is provided to the first substrate transfer apparatus; a second substrate transfer apparatus, which is connected to the first substrate transfer apparatus, and which has a plurality of substrate processing apparatuses connected thereto; and a second air-releasing section that is provided to the second substrate transfer apparatus. At least one of the substrate processing apparatuses connected to the second substrate transfer apparatus is an oxidation apparatus.

Inventors:
SEINO TAKUYA (JP)
NISHIMURA KAZUMASA (JP)
TSUNEKAWA KOJI (JP)
WATANABE EISAKU (JP)
KANEKO SHIGEO (JP)
Application Number:
PCT/JP2013/003014
Publication Date:
February 13, 2014
Filing Date:
May 10, 2013
Export Citation:
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Assignee:
CANON ANELVA CORP (JP)
International Classes:
H01L43/12; H01L43/08
Domestic Patent References:
WO2009060541A12009-05-14
WO2012086183A12012-06-28
Foreign References:
JP2003253439A2003-09-10
JP2011138844A2011-07-14
JP2002171011A2002-06-14
JPS5037352A1975-04-08
Attorney, Agent or Firm:
OKABE, Yuzuru et al. (JP)
Okabe 讓 (JP)
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