Title:
TWO-COMPONENT SILICON WAFER CLEANING AGENT AND CLEANING METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2023/221731
Kind Code:
A1
Abstract:
The present invention belongs to the technical field of solar cell production. Disclosed are a two-component silicon wafer cleaning agent and a cleaning method thereof, used for manufacturing a silicon solar cell. The cleaning agent of the present invention comprises a component A and a component B. The component A comprises, in percentage by weight, the following ingredients: 5% to 10% of an inorganic alkali, 0.5% to 1.5% of an organic alkali, 4% to 8% of a dispersing agent, 3% to 5% of an oxidation inhibitor, and the balance of water. The component B comprises, in percentage by weight, the following ingredients: 12% to 15% of an alcohol ether solvent, and the balance of water. The present invention greatly improves the cleaning yield by means of selecting the ingredients of the cleaning agent. Moreover, the present invention does not use a hydrogen peroxide tank commonly used in the cleaning process, so that the safety of the cleaning process is improved.
Inventors:
SUN BIN (CN)
XU ZHIQUN (CN)
FU MINGQUAN (CN)
GAO DA (CN)
BI XIXING (CN)
MA WEIPING (CN)
XU ZHIQUN (CN)
FU MINGQUAN (CN)
GAO DA (CN)
BI XIXING (CN)
MA WEIPING (CN)
Application Number:
PCT/CN2023/089653
Publication Date:
November 23, 2023
Filing Date:
April 21, 2023
Export Citation:
Assignee:
GOKIN SOLAR CO LTD (CN)
GUANGDONG JINWAN GOKIN SOLAR TECH CO LTD (CN)
GUANGDONG JINWAN GOKIN SOLAR TECH CO LTD (CN)
International Classes:
C11D7/06; B08B3/08; C11D7/26; C11D7/32; C11D7/50; C11D7/60
Foreign References:
| CN114836274A | 2022-08-02 | |||
| CN112745994A | 2021-05-04 | |||
| CN108330025A | 2018-07-27 | |||
| CN112745990A | 2021-05-04 | |||
| CN107686776A | 2018-02-13 | |||
| JP2014172964A | 2014-09-22 | |||
| CN111286415A | 2020-06-16 | |||
| JPH11279590A | 1999-10-12 |
Attorney, Agent or Firm:
SCIHEAD IP LAW FIRM (CN)
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