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Title:
ULTRAPURE WATER PRODUCTION METHOD, ULTRAPURE WATER PRODUCTION SYSTEM AND ION EXCHANGER FILLING MODULE
Document Type and Number:
WIPO Patent Application WO/2019/221187
Kind Code:
A1
Abstract:
This ultrapure water production method, for treating raw water for ultrapure water production with an ultrapure water production device to supply the obtained ultrapure water to a use point, is characterized in that: said raw water for ultrapure water production contains at least one element selected from B, As, Al, Ti, Cr, Fe, Cu, Zn, Sn, V, Ga and Pb; an ion exchanger filling module filled with at least a monolithic organic porous anion exchanger is installed in a treatment path of the ultrapure water production device or in a transport path from the ultrapure water production device to the user point; and the water to be treated is treated by being passed through the ion exchanger filling module. By means of this invention, it is possible to provide a method for producing ultrapure water for semiconductor manufacturing processes in which raw water for ultrapure water production that contains at least one element selected from B, As, Al, Ti, Cr, Fe, Cu, Zn, Sn and Sb is used as the raw water for ultrapure water production.

Inventors:
TSUTANO KYOHEI (JP)
TAKADA HITOSHI (JP)
Application Number:
PCT/JP2019/019348
Publication Date:
November 21, 2019
Filing Date:
May 15, 2019
Export Citation:
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Assignee:
ORGANO CORP (JP)
International Classes:
C02F1/42; B01J39/05; B01J39/20; B01J41/05; B01J41/14; B01J47/022; B01J47/024; B01J47/028
Domestic Patent References:
WO2010070774A12010-06-24
Foreign References:
JP2010264344A2010-11-25
JP2007313506A2007-12-06
JP2000140631A2000-05-23
JP2017000970A2017-01-05
JPS5715885A1982-01-27
Attorney, Agent or Firm:
ASHITABA INTERNATIONAL PATENT OFFICE (JP)
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