Title:
ULTRASONIC PROBE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2017/145514
Kind Code:
A1
Abstract:
An ultrasonic probe which is provided with a substrate 301, a lower electrode 102 that is formed on the substrate 301, a lower insulating film 303 that is formed on the lower electrode 102, an upper insulating film 305 that is formed on the lower insulating film 303 so as to form a hollow cavity 103 between itself and the lower insulating film 303, and an upper electrode 105 that is formed on the upper insulating film 305. The hollow cavity 103 overlaps the lower electrode 102; the upper electrode 105 overlaps the hollow cavity 103 and the lower electrode 102; and the upper insulating film 305 has a larger leakage current than the lower insulating film 303.
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Inventors:
MINE TOSHIYUKI (JP)
MACHIDA SHUNTARO (JP)
MACHIDA SHUNTARO (JP)
Application Number:
PCT/JP2016/088621
Publication Date:
August 31, 2017
Filing Date:
December 26, 2016
Export Citation:
Assignee:
HITACHI LTD (JP)
International Classes:
H04R19/00; A61B8/14; G01N29/24; H04R31/00
Domestic Patent References:
WO2012127737A1 | 2012-09-27 |
Foreign References:
JP2009272824A | 2009-11-19 | |||
JP2008099036A | 2008-04-24 | |||
JP2014236841A | 2014-12-18 | |||
JP2008093214A | 2008-04-24 |
Attorney, Agent or Firm:
TSUTSUI & ASSOCIATES (JP)
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