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Patent Searching and Data


Title:
ULTRAVIOLET LIGHT ABSORBENT COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2011/089968
Kind Code:
A1
Abstract:
Provided is an ultraviolet light absorbent composition which is highly soluble in organic solvents and exhibits an ultraviolet light shielding effect even in long wavelength regions, and which has light resistance. Specifically provided is an ultraviolet light absorbent composition which contains a compound represented by general formula (1) and an ultraviolet light absorbent material having a maximum absorption wavelength of 270 to 400nm. [R1a, R1c and R1e represent hydrogen atoms. R1b and R1d independently represent hydrogen atoms or substituents having a positive Hammett σp value, with at least one of the two representing a substituent having a positive Hammett σp value. R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represent hydrogen atoms or monovalent substituents. The substituents may bond to one another to form rings.]

Inventors:
AMASAKI Ichiro (())
尼崎 一路 (())
KIMURA Keizo (())
Application Number:
JP2011/050487
Publication Date:
July 28, 2011
Filing Date:
January 13, 2011
Export Citation:
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Assignee:
FUJIFILM Corporation (26-30, Nishiazabu 2-chome Minato-k, Tokyo 31, 〒1060031, JP)
富士フイルム株式会社 (〒31 東京都港区西麻布2丁目26番30号 Tokyo, 〒1060031, JP)
AMASAKI Ichiro (())
尼崎 一路 (())
International Classes:
C09K3/00; C07D251/24
Attorney, Agent or Firm:
TAKAMATSU Takeshi et al. (Koh-Ei Patent Firm, Toranomon East Bldg. 9F 7-13, Nishi-Shimbashi 1-chome, Minato-k, Tokyo 03, 〒1050003, JP)
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Claims: