UNDERLYING LAYER OF ALIGNMENT FILM FOR OXIDE SUPERCONDUCTOR, METHOD OF FORMING SAME, AND DEVICE FOR FORMING SAME

WIPO Patent Application WO/2011/043409

A1

Disclosed is a method of forming an underlying layer of an alignment film for an oxide superconductor, which comprises arranging two or more kinds of targets in the longitudinal direction of a base such that the targets oppose a surface of the base; simultaneously irradiating surfaces of the two or more kinds of targets with ion beams so that constituent particles of the two or more kinds of targets are deposited on the surface of the base in the order in which the two or more kinds of targets are arranged; and forming a laminate including two or more kinds of thin layers repeatedly laminated on the surface of the base by passing the base through deposition regions of the constituent particles a plurality of times so that the constituent particles of the two or more kinds of targets are repeatedly deposited on the surface of the base at each passage of the base.

JP3928970	LAYERED TRANSPARENT CONDUCTIVE FILM
JP04321579	PRODUCTION OF SUPERCONDUCTING MEMBER
JP01257130	PRODUCTION OF SUPERCONDUCTING THICK FILM

HANYU Satoru (Sakura Works 1440, Mutsuzaki, Sakura-sh, Chiba 50, 〒2858550, JP)
羽生　智 (〒50 千葉県佐倉市六崎１４４０番地　株式会社フジクラ　佐倉事業所内 Chiba, 〒2858550, JP)

JP2010/067624

April 14, 2011

October 07, 2010

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Fujikura Ltd. (5-1 Kiba 1-chome, Kohtoh-ku Tokyo, 12, 〒1358512, JP)
株式会社フジクラ (〒12 東京都江東区木場１丁目５番１号 Tokyo, 〒1358512, JP)
HANYU Satoru (Sakura Works 1440, Mutsuzaki, Sakura-sh, Chiba 50, 〒2858550, JP)

H01B13/00; C23C14/08; C23C14/34; C23C14/46; H01B12/06

SHIGA Masatake et al. (1-9-2, Marunouchi Chiyoda-k, Tokyo 20, 〒1006620, JP)

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