UNDERLYING LAYER OF ALIGNMENT FILM FOR OXIDE SUPERCONDUCTOR, METHOD OF FORMING SAME, AND DEVICE FOR FORMING SAME

WIPO Patent Application WO/2011/043409

A1

Disclosed is a method of forming an underlying layer of an alignment film for an oxide superconductor, which comprises arranging two or more kinds of targets in the longitudinal direction of a base such that the targets oppose a surface of the base; simultaneously irradiating surfaces of the two or more kinds of targets with ion beams so that constituent particles of the two or more kinds of targets are deposited on the surface of the base in the order in which the two or more kinds of targets are arranged; and forming a laminate including two or more kinds of thin layers repeatedly laminated on the surface of the base by passing the base through deposition regions of the constituent particles a plurality of times so that the constituent particles of the two or more kinds of targets are repeatedly deposited on the surface of the base at each passage of the base.

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HANYU SATORU (JP)
IIJIMA YASUHIRO (JP)

PCT/JP2010/067624

April 14, 2011

October 07, 2010

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FUJIKURA LTD (JP)
HANYU SATORU (JP)
IIJIMA YASUHIRO (JP)

H01B13/00; C23C14/08; C23C14/34; C23C14/46; H01B12/06

JP2005113220A	2005-04-28
JPH02152110A	1990-06-12
JPH01137525A	1989-05-30
JP2010123516A	2010-06-03
JP2010086796A	2010-04-15
US6921741B2	2005-07-26
US6933065B2	2005-08-23
JP2004263227A	2004-09-24
JP2558880B2	1996-11-27
JPH056586A	1993-01-14

See also references of EP 2477194A4

SHIGA Masatake et al. (JP)
Masatake Shiga (JP)

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