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Title:
UNSATURATED-GROUP-CONTAINING ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING UNSATURATED-GROUP-CONTAINING ALKALI-SOLUBLE RESIN AS ESSENTIAL INGREDIENT, AND CURED PRODUCT OF PHOTOSENSITIVE RESIN COMPOSITION INCLUDING UNSATURATED-GROUP-CONTAINING ALKALI-SOLUBLE RESIN AS ESSENTIAL INGREDIENT
Document Type and Number:
WIPO Patent Application WO/2019/188895
Kind Code:
A1
Abstract:
An alkali-soluble resin that is represented by general formula (1) and has a carboxyl group and a polymerizable unsaturated group in each molecule thereof. A photosensitive resin composition that contains: (i) the alkali-soluble resin of general formula (1); (ii) a photopolymerizable monomer that has at least one polymerizable unsaturated group; (iii) a photopolymerization initiator; and (iv) an optional epoxy compound.

Inventors:
NAMEKAWA SHUHEI (JP)
TAKANO MASAOMI (JP)
Application Number:
PCT/JP2019/012349
Publication Date:
October 03, 2019
Filing Date:
March 25, 2019
Export Citation:
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Assignee:
NIPPON STEEL CHEMICAL & MAT CO LTD (JP)
International Classes:
C08G59/17; C08F290/06; G03F7/027; G03F7/032
Foreign References:
JPH1060087A1998-03-03
JP2006160868A2006-06-22
JPH0680760A1994-03-22
JP2001089644A2001-04-03
Attorney, Agent or Firm:
WASHIDA, Kimihito (JP)
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