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Title:
UPPER LAYER FILM FORMING COMPOSITION, PATTERN FORMING METHOD, RESIST PATTERN, AND ELECTRONIC DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2016/157988
Kind Code:
A1
Abstract:
This upper layer film forming composition forms an upper layer film by being coated on a resist film which is formed using actinic ray-sensitive or radiation-sensitive resin composition, and contains a resin X and a compound A having a radical trapping group. This pattern forming method involves a step a for forming a resist film by coating an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate, a step b for forming an upper layer film on the resist film by a coating the resist film with the aforementioned upper layer film forming composition, a step c for exposing the resist film on which the upper layer film was formed, and a step d for forming a pattern by developing the exposed resist film using a developing solution that contains an organic solvent.

Inventors:
HATAKEYAMA Naoya (4000 Kawashiri, Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
INOUE Naoki (4000 Kawashiri, Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
TANGO Naohiro (4000 Kawashiri, Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
SHIRAKAWA Michihiro (4000 Kawashiri, Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
GOTO Akiyoshi (4000 Kawashiri, Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
Application Number:
JP2016/052985
Publication Date:
October 06, 2016
Filing Date:
February 02, 2016
Export Citation:
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Assignee:
FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome Minato-k, Tokyo 20, 〒1068620, JP)
International Classes:
G03F7/11; C08F20/36; C08F26/02; C08K5/32; C08L33/10; C08L33/16; C08L101/00; G03F7/32; H01L21/027
Domestic Patent References:
WO2014045783A12014-03-27
Foreign References:
JPH07140668A1995-06-02
JP2009229773A2009-10-08
JP2014012815A2014-01-23
JP2012088387A2012-05-10
JP2005266817A2005-09-29
JP2003233172A2003-08-22
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (6F FFTP M0 BLDG, 1250 Takematsu Minamiashigara-sh, Kanagawa 11, 〒2500111, JP)
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