Title:
UV-SENSITIVE SELF-HEALING POLYMER NANOPARTICLES, PREPARATION METHOD THEREFOR, AND FILM USING SAME
Document Type and Number:
WIPO Patent Application WO/2016/186336
Kind Code:
A1
Abstract:
The present invention relates to UV-sensitive self-healing polymer nanoparticles comprising a self-healing polymer single layer, and provides a preparation method therefor and a method for manufacturing a film using the UV-sensitive self-healing polymer nanoparticles. The UV-sensitive self-healing polymer nanoparticles and the film using the same have advantages of having a simple manufacturing method, having high polymer polymerization efficiency, and being able to repeatedly heal cracks caused by external stress.
Inventors:
LEE SUN JONG (KR)
CHUNG CHAN MOON (KR)
YOU HWAN CHEOL (KR)
KIM DONG MIN (KR)
KIM SUN YOUNG (KR)
CHUNG CHAN MOON (KR)
YOU HWAN CHEOL (KR)
KIM DONG MIN (KR)
KIM SUN YOUNG (KR)
Application Number:
PCT/KR2016/004438
Publication Date:
November 24, 2016
Filing Date:
April 28, 2016
Export Citation:
Assignee:
KOREA IND TECH INST (KR)
International Classes:
C08J3/12; C08F2/22; C08F2/48; C08F8/48; C08J5/18; C08L101/02; C09D201/02
Foreign References:
| KR101498361B1 | 2015-03-11 | |||
| KR20090043726A | 2009-05-07 | |||
| KR20150041207A | 2015-04-16 | |||
| KR101168038B1 | 2012-07-27 |
Other References:
CHO, S. Y. ET AL.: "Photochemical Crack Healing in Cinnamate-based Polymers", JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, vol. 10, no. 10, 2010, pages 6972 - 6976
Attorney, Agent or Firm:
HAN, SANG SOO (KR)
한상수 (KR)
한상수 (KR)
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