Title:
VACUUM DEPOSITION COATING METHOD USING PATTERN MASK
Document Type and Number:
WIPO Patent Application WO/2018/034505
Kind Code:
A1
Abstract:
The present invention relates to a vacuum deposition coating method applying a pattern mask to a substrate so as to perform vacuum deposition once or multiple times, thereby maximizing a visibility effect such as haze and a reduction in the visibility of fingerprints and handprints, and enabling an aesthetic sense to be improved through a pattern design.
Inventors:
KIM HYUN JOONG (KR)
KIM HONG CHUL (KR)
KIM JEONG RAE (KR)
CHOI BYEONG GYEONG (KR)
SHIN DONG HYUN (KR)
KIM CHEOL MIN (KR)
KIM HONG CHUL (KR)
KIM JEONG RAE (KR)
CHOI BYEONG GYEONG (KR)
SHIN DONG HYUN (KR)
KIM CHEOL MIN (KR)
Application Number:
PCT/KR2017/008948
Publication Date:
February 22, 2018
Filing Date:
August 17, 2017
Export Citation:
Assignee:
CEKO CO LTD (KR)
International Classes:
C23C14/04; C09D5/16; C23C14/02; C23C14/06; C23C14/08; C23C14/14
Foreign References:
| JP2008020264A | 2008-01-31 | |||
| KR20020075643A | 2002-10-05 | |||
| JPH09125228A | 1997-05-13 | |||
| JPH10330910A | 1998-12-15 | |||
| JP2003027212A | 2003-01-29 |
Attorney, Agent or Firm:
HANSUNG INTELLECTUAL PROPERTY (KR)
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