Title:
VACUUM DEPOSITION DEVICE AND VACUUM DEPOSITION METHOD
Document Type and Number:
WIPO Patent Application WO/2022/138934
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a vapor deposition device, etc., which is capable of highly accurate deposition even at a film deposition speed of 0.01 nm/s or lower. This vacuum deposition device includes a vacuum chamber and deposits a material onto a substrate, the vacuum deposition device comprising: a crucible for holding the material in the vacuum chamber; an induction coil which heats the crucible; and a crystal oscillator disposed near the substrate, wherein the vacuum deposition device further comprises an oscillator which is connected to the crystal oscillator and oscillates the crystal oscillator, a digital conversion unit which converts information from the crystal oscillator to a digital format, and a noise correction processing unit which performs correction to suppress noise of a digital signal obtained from the conversion by the digital conversion unit, and which estimates the film deposition speed.
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Inventors:
KOBAYASHI SHINICHIRO (JP)
TAKEDA KENGO (JP)
MIYAZAKI HIROSHI (JP)
TAKEDA KENGO (JP)
MIYAZAKI HIROSHI (JP)
Application Number:
PCT/JP2021/048298
Publication Date:
June 30, 2022
Filing Date:
December 24, 2021
Export Citation:
Assignee:
FUKUOKA INDUSTRY SCIENCE & TECH FOUNDATION (JP)
International Classes:
C23C14/24; C23C14/52; H01L51/50; H05B33/10
Foreign References:
| JP2013173965A | 2013-09-05 | |||
| JP2001013055A | 2001-01-19 | |||
| JP2007162042A | 2007-06-28 | |||
| JPH03243766A | 1991-10-30 | |||
| JPH0320465A | 1991-01-29 |
Attorney, Agent or Firm:
MINE Masaki (JP)
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