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Title:
VACUUM DEPOSITION EQUIPMENT AND VACUUM DEPOSITION METHOD
Document Type and Number:
WIPO Patent Application WO/2012/086230
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide vacuum deposition equipment and a vacuum deposition method that can deposit a vapor deposition material on a target member more stably while suppressing the deterioration of the deposition material by means of heating. Vacuum deposition equipment (1) has an opening and is provided with a container (4) capable of accommodating an evaporation material (3), and multiple heat sources (5) capable of heat control separately from the outside, the multiple heat sources (5) being fixed in the container (4) so that the evaporation material (3) is brought into contact with the multiple heat sources (5) when the evaporation material (3) is accommodated in the container (4). By making the heat sources (5) come into direct contact with the evaporation material (3), the evaporation material (3) can be efficiently heated.

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Inventors:
HIRANO, Tatsuya (C/O MITSUBISHI HEAVY INDUSTRIES LTD, 16-5, Konan 2-chome, Minato-k, Tokyo 15, 〒1088215, JP)
平野　竜也 (〒15 東京都港区港南二丁目１６番５号　三菱重工業株式会社内 Tokyo, 〒1088215, JP)
Application Number:
JP2011/061268
Publication Date:
June 28, 2012
Filing Date:
May 17, 2011
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Assignee:
MITSUBISHI HEAVY INDUSTRIES, LTD. (16-5, Konan 2-chome Minato-k, Tokyo 15, 〒1088215, JP)
三菱重工業株式会社 (〒15 東京都港区港南二丁目１６番５号 Tokyo, 〒1088215, JP)
HIRANO, Tatsuya (C/O MITSUBISHI HEAVY INDUSTRIES LTD, 16-5, Konan 2-chome, Minato-k, Tokyo 15, 〒1088215, JP)
International Classes:
C23C14/24; H01L51/50; H05B33/10
Attorney, Agent or Firm:
FUJITA, Takaharu et al. (37F The Landmark Tower Yokohama, 2-2-1 Minatomirai, Nishi-ku, Yokohama-sh, Kanagawa 37, 〒2208137, JP)
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