Title:
VACUUM DEVICE, ATTRACTION DEVICE, AND CONDUCTIVE THIN FILM MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/093362
Kind Code:
A8
Abstract:
According to the present invention, a conductive thin film is grown while a dielectric object to be attracted is being erected. First positive and negative electrodes 31, 41 are placed in a first region 21 provided in the upper part of an attraction plate 14, while second positive and negative electrodes 32, 42, which have a greater width than the first positive and negative electrodes 31, 41 and which are laid at a greater interval than between the first positive and negative electrodes, are placed in a second region provided between a rotational axis line 10 and the first region 21. While the dielectric object is being attracted by a gradient force generated through application of a first voltage on the first positive and negative electrodes 31, 41, the attraction plate 14 is brought into an upright position from a horizontal position; and while a second voltage is being applied to the second positive and negative electrodes 32, 42, a conductive thin film is grown on the surface of the object 8 being attracted. In this configuration, the object 8 continues to be attracted, and thus will not fall off from the attraction plate 14. By introducing a heating medium gas between the object being attracted and the attraction plate 14 after attraction by an electrostatic force starts, the temperature of the object being attracted can be controlled.
Inventors:
MAEHIRA KEN (JP)
FUWA KOH (JP)
KITTAKA TOMOKO (JP)
OHNO TETSUHIRO (JP)
SAKAUE HIROTOSHI (JP)
FUWA KOH (JP)
KITTAKA TOMOKO (JP)
OHNO TETSUHIRO (JP)
SAKAUE HIROTOSHI (JP)
Application Number:
PCT/JP2018/041306
Publication Date:
July 11, 2019
Filing Date:
November 07, 2018
Export Citation:
Assignee:
ULVAC INC (JP)
International Classes:
H01L21/683; C23C14/50; H01L21/285; H02N13/00
Attorney, Agent or Firm:
ISHIJIMA Shigeo et al. (JP)
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