Title:
VACUUM DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/046886
Kind Code:
A1
Abstract:
Disclosed is a vacuum device that is provided with an extremely high-vacuum exhaust pump. The extremely high-vacuum exhaust pump is provided with: a bar-like cathode (101) containing a non-evaporating getter alloy; a cylindrical anode (103) that is disposed to surround the periphery of the cathode; and coils (104) or ring-like permanent magnets, which are disposed to sandwich openings at the top and bottom of the cylindrical anode (103) and to surround the bar-like cathode (101). Consequently, the size and weight of the extremely high-vacuum exhaust pump can be reduced, and the vacuum exhaust pump can be disposed at a desired area of the vacuum device.
Inventors:
KATAGIRI SOUICHI (JP)
KASUYA KEIGO (JP)
KASUYA KEIGO (JP)
Application Number:
PCT/JP2015/076250
Publication Date:
March 23, 2017
Filing Date:
September 16, 2015
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J41/16; F04B37/02; H01J41/20
Domestic Patent References:
| WO2014132758A1 | 2014-09-04 |
Foreign References:
| JPH0465057A | 1992-03-02 | |||
| JP2001110286A | 2001-04-20 | |||
| JPH0667870U | 1994-09-22 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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