Title:
VACUUM DRYING DEVICE AND VACUUM DRYING METHOD
Document Type and Number:
WIPO Patent Application WO/2022/196312
Kind Code:
A1
Abstract:
The vacuum drying device comprises: a chamber for housing a substrate having a plurality of coated regions on which a coating layer including a solvent is formed; a substrate-holding stage for holding the substrate inside the chamber; side wall portions arranged around the substrate held on the substrate-holding stage; partitions arranged on the inside of the side wall portions, the partitions partitioning the space of the plurality of coated regions on the substrate into each coating region; baffle plates arranged so as to close the spaces partitioned by the side wall portions and the partitions at positions facing the substrate and having a plurality of through-holes formed therein; a gas supply unit for supplying an inert gas to the inside of the chamber; and a vacuum unit for reducing the pressure inside the chamber.
Inventors:
MAKIMOTO ATSUSHI
YOSHIDA HIDEHIRO
YOSHIDA HIDEHIRO
Application Number:
PCT/JP2022/008123
Publication Date:
September 22, 2022
Filing Date:
February 28, 2022
Export Citation:
Assignee:
PANASONIC IP MAN CO LTD (JP)
International Classes:
B05C9/12; B05D3/00; B05D3/04; B05D3/12; F26B5/04; H01L27/32; H01L51/50; H05B33/10
Foreign References:
| JP2003158061A | 2003-05-30 | |||
| JP2007090200A | 2007-04-12 | |||
| JP2010054070A | 2010-03-11 | |||
| JP2011071013A | 2011-04-07 |
Attorney, Agent or Firm:
KAMATA Kenji et al. (JP)
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