VACUUM DRYING SYSTEM AND VACUUM DRYING METHOD

WIPO Patent Application WO/2017/076081

A1

A vacuum drying system and method. The system comprises a supporting platform (1) and a mechanical arm (2). The supporting platform (1) is used for supporting a base substrate (3) and comprises multiple sub-platforms (11) disposed in a preset direction, and a gap is formed between adjacent sub-platforms (11). The mechanical arm (2) comprises multiple strip-shaped structures (21) corresponding to the location of the gaps, and is used for disposing the base substrate (3) onto the supporting platform (1) or moving the base substrate (3) away from the supporting platform (1). According to the technical solution of the present invention, the base substrate (3) is supported by means of the supporting platform (1), the contact area between the supporting platform (1) and the base substrate is much larger than that in vacuum drying processes in which the base substrate (3) is supported by means of multiple needle-shaped supports in the prior art, and accordingly the local pressure on the base substrate (3) can be reduced, thereby avoiding non-uniformity of the display brightness due to the supporting operation of the base substrate (3) in the vacuum drying process. In addition, a wider virtual area does not need to be provided, and the area of the base substrate (3) can be effectively used.

AN YUSHENG (CN)
MENG QINGYONG (CN)

PCT/CN2016/092993

May 11, 2017

August 03, 2016

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BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI BOE OPTOELECTRONICS TECH (CN)

B05D3/00

CN104617017A	2015-05-13
CN105195397A	2015-12-30
CN202292780U	2012-07-04
CN2919303Y	2007-07-04

CHINA PATENT AGENT (H.K.) LTD. (CN)

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