Title:
VACUUM FILM FORMATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/030872
Kind Code:
A1
Abstract:
This vacuum film formation device (100) forms a plurality of substrates (20) in a vacuum state, and comprises: a plurality of substrate holders (23) for supporting a substrate; a substrate unit (2) for supporting and conveying the plurality of substrate holders (23); and a vacuum chamber (1) for forming a vacuum state, the vacuum chamber having a conveyance entrance (10) via which the substrate unit (2) is conveyed in and out, and a conveyance entrance door (11) for opening and closing the conveyance entrance (10). The substrate unit (2) supports the plurality of substrate holders (23) so as to be arranged in-line with the conveyance direction in relation to the vacuum chamber (1), and the conveyance entrance (10) is formed in accordance with the dimensions of the substrate unit (2). The vacuum film formation device (100) can thereby reduce the time required to discharge moisture and minimize the time required for the film formation process.
Inventors:
AMAKU HAYATO
Application Number:
PCT/JP2011/004819
Publication Date:
March 07, 2013
Filing Date:
August 30, 2011
Export Citation:
Assignee:
SHINMAYWA IND LTD (JP)
AMAKU HAYATO
AMAKU HAYATO
International Classes:
C23C14/24
Foreign References:
| JPH05271935A | 1993-10-19 | |||
| JP2004099947A | 2004-04-02 | |||
| JPH04174327A | 1992-06-22 |
Attorney, Agent or Firm:
PATENT CORPORATE BODY ARCO PATENT OFFICE (JP)
Patent business corporation Owner old patent firm (JP)
Patent business corporation Owner old patent firm (JP)
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