Title:
VACUUM PUMP, AND ROTATING BLADE AND REFLECTION MECHANISM MOUNTED ON VACUUM PUMP
Document Type and Number:
WIPO Patent Application WO/2017/104541
Kind Code:
A1
Abstract:
[Problem] To provide: a vacuum pump with which particles are prevented from flowing back towards the gas inflow side; and a rotating blade and a reflection mechanism mounted on the vacuum pump. [Solution] A reflection mechanism 30 is installed above rotating blades 102a. A chamfered surface 21 of the rotating blades 102a is formed so as to gradually expand, with increasing distance downstream, in a direction angled towards the direction of rotation by 0-10° relative to an imaginary line 11 which passes through the rotation direction-side tip 9 of a horizontal surface 1 and which is parallel to the rotation axis. In the reflection mechanism 30, inclined plates 33 inclined at a predetermined angle are installed so as to radiate in the radial direction from a center disc section 35. Particles reflected by the chamfered surface 21 of the rotating blades 102a collide with the inclined plates 33 of the reflection mechanism 30, and the resulting re-reflection causes the particles to fall in the downstream direction. Because it is possible to ensure that the particles are reflected towards the reflection mechanism 30, the particles can be prevented from being ejected from an intake port 101 and flowing back towards the chamber side.
Inventors:
KABASAWA TAKASHI (JP)
Application Number:
PCT/JP2016/086592
Publication Date:
June 22, 2017
Filing Date:
December 08, 2016
Export Citation:
Assignee:
EDWARDS JAPAN LTD (JP)
International Classes:
F04D19/04
Domestic Patent References:
| WO2008065798A1 | 2008-06-05 |
Foreign References:
| JP2004019493A | 2004-01-22 | |||
| JPS6125995A | 1986-02-05 |
Other References:
See also references of EP 3392508A4
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