Title:
VACUUM SYSTEM AND METHOD FOR OPERATING SAME
Document Type and Number:
WIPO Patent Application WO/2007/010851
Kind Code:
A1
Abstract:
Provided is a vacuum system wherein the rotating speed of a vacuum pump can be suitably adjusted
at the time of performing prescribed process in a vacuum chamber to contribute to
energy saving. A vacuum pump controller (33) in a semiconductor manufacturing system
(10) is provided with gas flow mode and auto-tuning mode. In the auto-tuning mode,
the rotating speed of a vacuum pump unit (30) is determined so that an operation quantity
of an APC valve (22) is at a target value within a range which is less than the full
operation quantity by a prescribed quantity, in a status where the inside of a
process chamber (21) is in a vacuum required in the gas flow mode. The vacuum pump
controller is provided with a means for judging whether the operation quantity of
the APC valve (22) reached the target value or not, by reducing the rotating speed
of the vacuum pump unit (30) from a rated speed, in a status where the inside of the
process chamber (21) is in the vacuum required in the gas flow mode, for operation in
the auto-tuning mode; and a means for storing the rotating speed of the vacuum pump
unit (30) as a rotating speed in the gas flow mode when it is judged that the operation
quantity reached the target value.
Inventors:
TANAKA HIROYUKI
ANDO KIYOSHI
ANDO KIYOSHI
Application Number:
PCT/JP2006/314056
Publication Date:
January 25, 2007
Filing Date:
July 14, 2006
Export Citation:
Assignee:
NABTESCO CORP (JP)
ASM JAPAN (JP)
TANAKA HIROYUKI
ANDO KIYOSHI
ASM JAPAN (JP)
TANAKA HIROYUKI
ANDO KIYOSHI
International Classes:
F04B37/16
Foreign References:
| JP2003278664A | 2003-10-02 | |||
| JPH0239427A | 1990-02-08 | |||
| JP2004332741A | 2004-11-25 |
Attorney, Agent or Firm:
ARIGA, Gunichiro (2-4-9 Yoyogi, Shibuya-k, Tokyo 53, JP)
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