Title:
VACUUM TREATING DEVICE AND VACUUM TREATING METHOD
Document Type and Number:
WIPO Patent Application WO/2007/080934
Kind Code:
A1
Abstract:
An exhaust mechanism (24) evacuates the inside of a vacuum transporting chamber (10)
at a constant exhaust amount or exhaust rate. An exhaust valve (36) is kept normally
open, and purge gas (N2 gas) is supplied from a purge gas supply source
(30) into the vacuum transporting chamber (10) via an MFC (34) and an on/off valve
(36). A main control unit (38) controls a pressure in the vacuum transporting chamber
(10) to within a specified range through a flow rate value set to the MFC (34), monitors,
at the same time, a pressure in the vacuum transporting chamber (10) via a vacuum
gage (40), and judges abnormality when the pressure exceeds a specified upper
limit to take such actions as changing a flow rate value set to the MFC (34), giving
an alarm and stopping a device operation.
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Inventors:
KONDO, Masaki (())
近藤 昌樹 (())
HAYASHI, Teruyuki (())
近藤 昌樹 (())
HAYASHI, Teruyuki (())
Application Number:
JP2007/050271
Publication Date:
July 19, 2007
Filing Date:
January 11, 2007
Export Citation:
Assignee:
TOKYO ELECTRON LIMITED (3-6 Akasaka 5-chome, Minato-ku Tokyo, 81, 1078481, JP)
東京エレクトロン株式会社 (〒81 東京都港区赤坂五丁目３番６号 Tokyo, 1078481, JP)
KONDO, Masaki (())
近藤 昌樹 (())
東京エレクトロン株式会社 (〒81 東京都港区赤坂五丁目３番６号 Tokyo, 1078481, JP)
KONDO, Masaki (())
近藤 昌樹 (())
International Classes:
C23C16/44; H01L21/02; H01L21/027; H01L21/205; H01L21/304; H01L21/3065
Attorney, Agent or Firm:
SUZUYE, Takehiko et al. (1-12-9 Toranomon, Minato-k, Tokyo 01, 1050001, JP)
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