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Title:
VALVE DEVICE, ADJUSTMENT INFORMATION GENERATING METHOD, FLOW ADJUSTMENT METHOD, FLUID CONTROL DEVICE, FLOW CONTROL METHOD, SEMICONDUCTOR MANUFACTURING DEVICE AND SEMICONDUCTOR MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/059040
Kind Code:
A1
Abstract:
A valve device is provided which can precisely adjust flow variation over time and with aging, without using external sensors, or using as few external sensors as possible. This valve device is provided with an adjustment actuator (100) for adjusting the position of an operation member positioned in an open position, a communication unit (210) which receives, from outside of the device, adjustment information relating to adjustment of the degree of opening of the flow path by a valve body, and a control unit (220) which, on the basis of the adjustment information, drives the adjustment actuator (100) to adjust the position of the operation member.

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Inventors:
KONDO KENTA (JP)
YOSHIDA TOSHIHIDE (JP)
SATO HIDENOBU (JP)
NAKATA TOMOHIRO (JP)
SHINOHARA TSUTOMU (JP)
TAKIMOTO MASAHIKO (JP)
Application Number:
PCT/JP2018/033583
Publication Date:
March 28, 2019
Filing Date:
September 11, 2018
Export Citation:
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Assignee:
FUJIKIN KK (JP)
International Classes:
F16K31/122; H01L21/02; H01L21/31; F16K7/12; F16K31/02
Domestic Patent References:
WO2004079243A12004-09-16
Foreign References:
JP2004257420A2004-09-16
Attorney, Agent or Firm:
FUJIMOTO Kenji (JP)
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