VALVE DEVICE, FLOW RATE CONTROL METHOD USING SAID VALVE DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR

Title:

VALVE DEVICE, FLOW RATE CONTROL METHOD USING SAID VALVE DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR

Document Type and Number:

WIPO Patent Application WO/2018/088326

Kind Code:

A1

Abstract:

[Problem] To provide a valve device for which the person-hours required for flow rate adjustment have been greatly reduced. [Solution] The present invention includes: a valve body 10 that demarcates a flow path 12; a valve element 20 provided so as to be capable of opening and closing the flow path 12 of the valve body; an operating member 40 that operating the valve element in opening and closing directions A1, A2 in which the valve element 20 is caused to open or close the flow path 12, the operating member being provided so as to be capable of moving between a closed position CP at which the valve element 20 closes the flow path and an opening position OP at which the valve element 20 opens the flow path 12, such positions being set in advance; a main actuator 60 for causing the operating member 40 to move in the opening direction A1; and a piezoelectric actuator 100 for adjusting a position of the operating member 40 positioned at the opening position OP.

Inventors:

YOSHIDA TOSHIHIDE (JP)
NAKATA TOMOHIRO (JP)
SHINOHARA TSUTOMU (JP)
INADA TOSHIYUKI (JP)
FUNAKOSHI TAKASHI (JP)

Application Number:

PCT/JP2017/039729

Publication Date:

May 17, 2018

Filing Date:

November 02, 2017

Export Citation:

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Assignee:

FUJIKIN KK (JP)

International Classes:

F16K31/02; F16K31/122

Domestic Patent References:

WO2004079243A1

2004-09-16

Foreign References:

JPH08170755A	1996-07-02
JP2007064333A	2007-03-15
JP2016121776A	2016-07-07

Other References: