VALVE DEVICE, FLOW RATE CONTROL METHOD USING VALVE DEVICE, FLUID CONTROL DEVICE, SEMICONDUCTOR PRODUCTION METHOD, AND SEMICONDUCTOR PRODUCTION DEVICE

WIPO Patent Application WO/2020/158459

A1

[Problem] To provide a valve device capable of precisely adjusting a flow rate. [Solution] The present invention has: an operation member 40 that operates a diaphragm provided so as to be movable between a closed position CP at which a flow path is closed by a diaphragm 20 and an open position OP at which the flow path is opened by the diaphragm 20; a main actuator 60 that receives pressure from a supplied drive fluid and moves the operation member 40 to the open position OP or the closed position CP; an adjustment actuator 100 that is for adjusting the position of the operation member 40 positioned in the open position OP and uses a passive element which expands and contracts in accordance with a given input signal; a position detection mechanism 85 that is for detecting the position of the operation member 40 relative to a valve body 10; and a starting position determination unit that uses a closed-valve state in which the diaphragm 20 is in contact with a valve seat 15 to determine the starting position of the position detection mechanism 85.

JP5802671	Water faucet
JP2003139270	OPENING AND CLOSING VALVE PROVIDED WITH OPERATION DETECTION MECHANISM OF VALVE ELEMENT

TSUCHIGUCHI DAIHI (JP)
YOSHIDA TOSHIHIDE (JP)
TANNO RYUTARO (JP)
SUZUKI YUYA (JP)
KONDO KENTA (JP)
NAKATA TOMOHIRO (JP)
SHINOHARA TSUTOMU (JP)
TAKIMOTO MASAHIKO (JP)

PCT/JP2020/001534

August 06, 2020

January 17, 2020

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FUJIKIN KK (JP)

F16K37/00; F16K7/16; F16K7/17; F16K31/02; F16K31/122

WO2018088326A1

2018-05-17

JP2018085365A	2018-05-31
JP2007064333A	2007-03-15

KEN IP LAW FIRM (JP)

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