VALVE DEVICE AND GAS SUPPLY SYSTEM

WIPO Patent Application WO/2020/085300

A1

[Problem] To provide a valve device which has a structure more suitable for miniaturization and integration and which is used for a semiconductor manufacturing process or the like. [Solution] A valve device comprising: a valve body 3 which is accommodated in an accommodating recess portion 35 and has a first port 3p1 and a second port 3p2 in a bottom surface; and a bonnet nut 20 which has a screw portion 20a formed on an outer periphery thereof and which, by threadedly engaging with the inner periphery of the accommodating recess portion 35, fixes the valve body 3 onto a flow passageway block 30 while pressing the valve body 3 toward the bottom of the accommodating recess portion 35. The valve body 3 has first and second annular projections 4a, 4b for sealing which are formed around the first port 3p1 and the second port 3p2 and protrude from a bottom surface 3d. The first and the second annular projections 4a, 4b are formed so as to have partially common portions.

JPH07310703	MANIFOLD
JP2008540960	Isolation valve for high energy and high temperature gas
JPS60123468	[Title of the device] Electromagnetic valve

AIKAWA KENJI (JP)
MATSUDA TAKAHIRO (JP)
HARADA AKIHIRO (JP)
WATANABE KAZUNARI (JP)
NAKATA TOMOHIRO (JP)
SHINOHARA TSUTOMU (JP)

PCT/JP2019/041303

April 30, 2020

October 21, 2019

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FUJIKIN KK (JP)

F16K27/00

JP2013117269A	2013-06-13
JPH06341560A	1994-12-13
JPH0932954A	1997-02-07

KEN IP LAW FIRM (JP)

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