Title:
VALVE DEVICE AND GAS SUPPLY SYSTEM
Document Type and Number:
WIPO Patent Application WO/2020/085302
Kind Code:
A1
Abstract:
[Problem] To provide a valve device that can be used, for example, in a process for manufacturing a semiconductor structure having a structure that is better suited to downscaling and integration. [Solution] The device comprises: a valve body 3 that is housed in a housing recess 35 having a circular cross-sectional shape, a first port 3p1 and a second port 3p2 being formed in the bottom surface of the valve body 3; and a bonnet nut 20 having an outer thread 20a that threadingly engages an inner thread 35s formed on the inner circumference of the housing recess 35, thereby anchoring the valve body 3 to a flow channel block 30 while compressing the valve body 3 toward the bottom of the housing recess 35. The valve body 3 comprises an outer circumferential surface 3f that mates with an inner circumferential surface 35a of the housing recess 35 in the flow channel block 30. A positioning protrusion 3a for defining the rotational position of the valve body 3, about an axis Ct, with respect to the flow channel block 30 is formed in the outer circumferential surface 3f.
Inventors:
MATSUDA TAKAHIRO (JP)
AIKAWA KENJI (JP)
HARADA AKIHIRO (JP)
WATANABE KAZUNARI (JP)
NAKATA TOMOHIRO (JP)
SHINOHARA TSUTOMU (JP)
AIKAWA KENJI (JP)
HARADA AKIHIRO (JP)
WATANABE KAZUNARI (JP)
NAKATA TOMOHIRO (JP)
SHINOHARA TSUTOMU (JP)
Application Number:
PCT/JP2019/041310
Publication Date:
April 30, 2020
Filing Date:
October 21, 2019
Export Citation:
Assignee:
FUJIKIN KK (JP)
International Classes:
F16K27/00
Foreign References:
| JP2013117269A | 2013-06-13 | |||
| JPH10300000A | 1998-11-13 |
Attorney, Agent or Firm:
KEN IP LAW FIRM (JP)
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