Title:
VALVE DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/207609
Kind Code:
A1
Abstract:
Provided is a valve device which allows fluid to flow at a flow rate according to the hole diameter of a through-hole formed in a valve body even when there is variation in the position of the valve body, and which also has a high degree of freedom with respect to the position of the through-hole. Specifically, this valve device 1 rotates the valve body 20 around a support shaft 29 on the basis of the rotation of a valve body drive member 50 and adjusts the flow rate by switching the through-hole 21 communicating with an outlet port 44 formed in a valve seat 40. The through-hole 21 opens to the bottom surface of a flow passage establishing groove 27 formed in the valve body 20. The flow passage establishing groove 27 has an elongated hole shape in which the width X1 in a first direction X (circumferential direction) which is the moving direction of the valve body 20 is smaller than the width Y1 in a second direction Y (diameter direction) perpendicular to the first direction X. Accordingly, a region overlapping the outlet port 44 is larger than in the case of forming a true circular flow passage establishing groove, and the space in the lower end surface 201 of the valve body 20 can be more effectively used than in the case of forming the true circular flow passage establishing groove.
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Inventors:
YOKOE SATORU (JP)
Application Number:
PCT/JP2018/016519
Publication Date:
November 15, 2018
Filing Date:
April 24, 2018
Export Citation:
Assignee:
NIDEC SANKYO CORP (JP)
International Classes:
F16K3/04; F16K31/04; F16K31/44
Domestic Patent References:
| WO2014147897A1 | 2014-09-25 | |||
| WO2014081037A1 | 2014-05-30 | |||
| WO2017208785A1 | 2017-12-07 |
Foreign References:
| JP2001141093A | 2001-05-25 | |||
| JP2001516861A | 2001-10-02 | |||
| US3559685A | 1971-02-02 | |||
| DE4139815A1 | 1993-06-09 |
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