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Title:
VALVE DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/187630
Kind Code:
A1
Abstract:
A valve device 100 is provided with a flow rate adjustment section 5 and a flow path switching section 7. The flow rate adjustment section 5 has a flow adjustment valve section 52 which changes the rate of flow flowing to a water discharge path 13, and a flow adjustment operation section 53 which can move the flow adjustment valve section 52. The flow path switching section 7 has a switching valve section 71 which switches between flow paths, and a flow path switching operation section 70 which can move the switching valve section 71. In the valve device 100, one of the flow adjustment operation section 53 and the flow path switching operation section 70 is subjected to push operation, and the other is subjected to pull operation.

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Inventors:
OZATO TAKASHI (JP)
SHIMIZU KOJI (JP)
Application Number:
PCT/JP2019/003835
Publication Date:
October 03, 2019
Filing Date:
February 04, 2019
Export Citation:
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Assignee:
LIXIL CORP (JP)
International Classes:
F16K31/44; E03C1/02
Foreign References:
JP2016138379A2016-08-04
JPS5356721A1978-05-23
Attorney, Agent or Firm:
MORISHITA Sakaki (JP)
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