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Title:
VANADIUM ACTIVE SUBSTANCE SOLUTION AND VANADIUM REDOX CELL
Document Type and Number:
WIPO Patent Application WO/2016/104500
Kind Code:
A1
Abstract:
[Problem] To provide: a vanadium active substance solution containing a vanadium active substance that comprises a dispersed phase (suspendible substance) and has a concentration of 2.5 M or greater in a sulfuric acid solution, and that is capable of stably retaining a high energy density on the basis of this concentration and that can accommodate high-speed charging and discharging; and a vanadium redox cell that uses the active substance solution. [Solution] The foregoing problem is solved by a vanadium active substance solution that contains, as the solute and the dispersed phase, a vanadium compound which is an active substance, and that has a total vanadium concentration in the active substance of 2.5 M or greater. In this case, the vanadium compound of the negative electrode solution is formed from divalent and/or trivalent vanadium. The vanadium compound of the positive electrode solution is formed from tetravalent and/or pentavalent vanadium. The vanadium compound of the active substance solution is formed from trivalent and/or tetravalent vanadium. The average diameter of the dispersed phase is within a range of 1 nm to 100 µm.

Inventors:
HOSOBUCHI KAORU (JP)
MATSUURA HIROAKI (JP)
Application Number:
PCT/JP2015/085827
Publication Date:
June 30, 2016
Filing Date:
December 22, 2015
Export Citation:
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Assignee:
GALAXY CORP (JP)
CHIKOUJI GAKUEN EDUCATIONAL FOUNDATION (JP)
International Classes:
H01M8/18; H01M8/02
Domestic Patent References:
WO2010143634A12010-12-16
WO2002095855A12002-11-28
Foreign References:
JPH09507950A1997-08-12
JP2011524074A2011-08-25
JP2014532284A2014-12-04
Attorney, Agent or Firm:
YOSHIMURA, SHUNICHI (JP)
Toshikazu Yoshimura (JP)
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