VAPOR CHAMBER PROCESSING METHOD AND VAPOR CHAMBER

WIPO Patent Application WO/2022/110366

A1

A vapor chamber (10) processing method, comprising: providing a first cover plate (11) provided with a first groove (110) and a second cover plate (12) provided with a second groove (120); performing cold spraying on the first cover plate (11) to form a first capillary structure (15) in the first groove (110); performing cold spraying on the second cover plate (12) to form a first capillary unit (161) in the second groove (120); performing cold spraying on the first capillary unit (161) to form a second capillary unit (162) on the first capillary unit (161), the cross-sectional area of the first capillary unit (161) being larger than the cross-sectional area of the second capillary unit (162) in a direction of a hot end (101) of the vapor chamber (10) pointing to a cold end (102); covering the first cover plate (11) and the second cover plate (12) such that the first capillary structure (161) abuts against the second capillary unit (162), and fixedly connecting the first cover plate (11) to the second cover plate (12) to form a closed inner cavity (14) between the first cover plate (11) and the second cover plate (12). The vapor chamber (10) processing method can reduce the manufacturing cost of the vapor chamber (10), improve the structural strength of the vapor chamber (10), and improve the heat dissipation effect of the vapor chamber (10).

YU YONGSHUI (CN)

PCT/CN2020/136967

June 02, 2022

December 16, 2020

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AAC ACOUSTIC TECH SHENZHEN CO LTD (CN)
AAC TECH NANJING CO LTD (CN)

B23P15/00; H05K7/20

CN102019543A	2011-04-20
CN211451989U	2020-09-08
CN111836518A	2020-10-27
TWI395918B	2013-05-11
CN110567304A	2019-12-13
CN110530184A	2019-12-03
CN102131368A	2011-07-20
JP2011102691A	2011-05-26

PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD. (CN)

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