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Patent Searching and Data


Title:
VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, AND METHOD FOR PRODUCING ORGANIC EL DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/038811
Kind Code:
A1
Abstract:
The vapor deposition apparatus disclosed in an embodiment comprises: a vacuum chamber (8); a mask holder (15), disposed in the vacuum chamber (8), for holding a vapor deposition mask 1; a substrate holder (29) for holding a substrate (2) to be subjected to vapor deposition so as to contact the held vapor deposition mask (1); an electromagnet (3) disposed above the substrate (2) being subjected to vapor deposition on the surface opposite that of the vapor deposition mask 1; a vapor deposition source 5 for gasifying or sublimating a vapor deposition material; and a heat pipe (7), at least the heat-absorbing part (71) of which contacts the electromagnet (3) and the heat-dissipating part (72) of which leads to the outside of the vacuum chamber (8). The heat pipe (7) and the electromagnet (3) are in close contact in a contact area equal to or greater than the cross-sectional area of the internal circumference of a coil (32). Temperature elevation of the electromagnet is suppressed and a vapor deposition pattern of good precision is obtained.

Inventors:
SAKIO SUSUMU (JP)
KISHIMOTO KATSUHIKO (JP)
Application Number:
PCT/JP2017/029814
Publication Date:
February 28, 2019
Filing Date:
August 21, 2017
Export Citation:
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Assignee:
SAKAI DISPLAY PRODUCTS CORP (JP)
International Classes:
C23C14/50; H01L27/32; H01L51/50; H05B33/10
Foreign References:
JP2010084204A2010-04-15
JP2000505152A2000-04-25
JP2008059757A2008-03-13
JP2011195907A2011-10-06
JPH1136075A1999-02-09
JP2010209459A2010-09-24
Attorney, Agent or Firm:
ASAHINA & CO. (JP)
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