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Title:
VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, AND PRODUCTION METHOD FOR ORGANIC EL DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/170059
Kind Code:
A1
Abstract:
Provided is a vapor deposition apparatus with which it is possible to inhibit generation of relatively large smudges that are not intended by design. In this vapor deposition apparatus (1), a recess (3U) is provided along a substrate scan direction in a region between two adjacent injection ports (4) on a restriction plate (59) side of a top plate (3f).

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Inventors:
INOUE SATOSHI
KAWATO SHINICHI
KOBAYASHI YUHKI
Application Number:
PCT/JP2017/011521
Publication Date:
October 05, 2017
Filing Date:
March 22, 2017
Export Citation:
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Assignee:
SHARP KK (JP)
International Classes:
C23C14/24; C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
WO2012098927A12012-07-26
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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