Title:
VAPOR DEPOSITION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2020/017047
Kind Code:
A1
Abstract:
This vapor deposition apparatus (3) is provided with a line-source vapor deposition source (1) and a crystal oscillator (2), wherein: the apparatus is further provided with adhesion preventing plates (6·8) and a tubular part (7) having a first conduction opening (7K) for guiding vapor deposition particles from a first nozzle (5S) to the crystal oscillator (2); the adhesion preventing plate (6) is connected to the tubular part (7) on the first nozzle (5S) side; the adhesion preventing plate (6) has formed therein a second conduction opening (DK); and at least a portion of the second conduction opening (DK) is larger in size than the first conduction opening (7K).
Inventors:
IMADA HIROSHI
TSUKAMOTO YUTO
TSUKAMOTO YUTO
Application Number:
PCT/JP2018/027373
Publication Date:
January 23, 2020
Filing Date:
July 20, 2018
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
C23C14/24; H05B33/10; H05B33/14
Domestic Patent References:
| WO2013024769A1 | 2013-02-21 | |||
| WO2014076770A1 | 2014-05-22 |
Foreign References:
| JP2005325391A | 2005-11-24 | |||
| JP2012112034A | 2012-06-14 | |||
| JP2012216373A | 2012-11-08 | |||
| US20020084958A1 | 2002-07-04 |
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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