Title:
VAPOR DEPOSITION DEVICE, DEVICE FOR MANUFACTURING ORGANIC EL PANEL, AND METHOD FOR MANUFACTURING ORGANIC EL PANEL
Document Type and Number:
WIPO Patent Application WO/2019/066087
Kind Code:
A8
Abstract:
Provided is a vapor deposition device enabling a vapor deposition source to be arranged in proximity to a vapor deposition mask or a substrate to improve directionality of a molecular flux of a film formation material, thereby increasing accuracy of a film formation pattern. The vapor deposition device is provided with: a vapor deposition tank holding therein a substrate having a film formation surface with which a deposition mask is in close contact; and a vapor deposition source arranged in the vapor deposition tank and emitting a film formation material toward the vapor deposition mask. The vapor deposition source includes: a container accommodating the film formation material and having an opening facing the vapor deposition mask; a heating device for heating the film formation material in the container; and an ultrasonic transducer for applying ultrasonic vibrations to the film formation material in the container.
Inventors:
MIZUMURA MICHINOBU (JP)
GOTO TETSUYA (JP)
GOTO TETSUYA (JP)
Application Number:
PCT/JP2018/037100
Publication Date:
July 11, 2019
Filing Date:
October 03, 2018
Export Citation:
Assignee:
V TECH CO LTD (JP)
UNIV TOHOKU (JP)
UNIV TOHOKU (JP)
International Classes:
C23C14/24; C23C14/04; H01L27/32; H01L51/50; H05B33/10
Attorney, Agent or Firm:
EICHI PATENT & TRADEMARK CORP. (JP)
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