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Title:
VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND ORGANIC ELECTROLUMINESCENCE ELEMENT MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2015/083600
Kind Code:
A1
Abstract:
The present invention provides a vapor deposition device that can lessen the impact of contamination, a vapor deposition method, and an organic electroluminescence element manufacturing method. The present invention is a vapor deposition device for forming a film on a substrate, wherein the following are provided: a vapor deposition chamber; a vapor deposition unit that includes a vapor deposition mask having openings for pattern formation; and a conveyance mechanism that can move, in a first direction perpendicular to the normal direction of the vapor deposition mask, either the substrate or the vapor deposition unit relative to the other, and that can temporarily stop, at a stop position, the substrate with respect to the vapor deposition unit. When the substrate is in the stop position, a subject-to-deposition region on the substrate does not overlap with the openings of the deposition mask. The vapor deposition chamber includes a first exhaust port and a second exhaust port. When the substrate is in the stop position, and when viewed along a second direction perpendicular to the normal direction and the first direction, at least a portion of the second exhaust port is positioned below the substrate.

Inventors:
KOBAYASHI YUHKI
KIKUCHI KATSUHIRO
KAWATO SHINICHI
OCHI TAKASHI
INOUE SATOSHI
MATSUNAGA KAZUKI
MATSUMOTO EIICHI (JP)
ICHIHARA MASAHIRO (JP)
Application Number:
PCT/JP2014/081339
Publication Date:
June 11, 2015
Filing Date:
November 27, 2014
Export Citation:
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Assignee:
SHARP KK (JP)
International Classes:
C23C14/54; C23C14/04; H01L51/50; H05B33/10
Foreign References:
JP2013159841A2013-08-19
JP2012233214A2012-11-29
JP2014019942A2014-02-03
JP2002234103A2002-08-20
Attorney, Agent or Firm:
YASUTOMI & Associates (JP)
Patent business corporation Yasutomi international patent firm (JP)
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