Title:
VAPOR DEPOSITION DEVICE AND VAPOR DEPOSITION METHOD
Document Type and Number:
WIPO Patent Application WO/2014/119548
Kind Code:
A1
Abstract:
A vapor deposition device (50) is provided with a plurality of vapor deposition masks (80) that have links in the Y-axial and X-axial directions shorter than those of a substrate (200) on which a film is to be formed. A vapor deposition mask (80) adjacent to the Y-axial direction is disposed offset in the X-axial direction. At a superimposed region (83), where each mask opening group region (82) adjacent to the Y-axial direction is superimposed in the X-axial direction, the opening length in the Y-axial direction in a plane view gradually becomes shorter toward the outside of each mask opening group region (82).
Inventors:
OCHI TAKASHI
KAWATO SHINICHI
KOBAYASHI YUHKI
NIBOSHI MANABU
INOUE SATOSHI
TSUKAMOTO YUTO
KIKUCHI KATSUHIRO
ICHIHARA MASAHIRO
MATSUMOTO EIICHI
KAWATO SHINICHI
KOBAYASHI YUHKI
NIBOSHI MANABU
INOUE SATOSHI
TSUKAMOTO YUTO
KIKUCHI KATSUHIRO
ICHIHARA MASAHIRO
MATSUMOTO EIICHI
Application Number:
PCT/JP2014/051784
Publication Date:
August 07, 2014
Filing Date:
January 28, 2014
Export Citation:
Assignee:
SHARP KK (JP)
CANON TOKKI CORP (JP)
CANON TOKKI CORP (JP)
International Classes:
C23C14/24; H01L51/50; H05B33/10
Domestic Patent References:
| WO2011145456A1 | 2011-11-24 | |||
| WO2012124512A1 | 2012-09-20 |
Foreign References:
| JP2012072461A | 2012-04-12 |
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
Patent business corporation HARAKENZO WORLD PATENT & TRADEMARK (JP)
Patent business corporation HARAKENZO WORLD PATENT & TRADEMARK (JP)
Download PDF:
Previous Patent: ADHESIVE FILM AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT
Next Patent: POSITIVE ELECTRODE CATALYST AND DEVICE
Next Patent: POSITIVE ELECTRODE CATALYST AND DEVICE