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Patent Searching and Data


Title:
VAPOR DEPOSITION DEVICE AND METHOD
Document Type and Number:
WIPO Patent Application WO/2019/119907
Kind Code:
A1
Abstract:
A vapor deposition device, comprising a housing (10) which is provided with a concave cavity (11) having an upward opening; a wafer stage (20) disposed inside the concave cavity (11); a sealing assembly (30) for sealing the concave cavity (11), so that a vacuum cavity is formed by the sealing assembly and the concave cavity (11); a gas homogenizing assembly (40) disposed in the vacuum cavity, located above the wafer stage (20), and guiding gas out toward the wafer stage (20); and a gas inlet assembly (50) that penetrates through the sealing assembly (30) and comprises a cleaning gas path and a pulse gas path, the cleaning gas path being communicated with the gas homogenizing assembly, and the pulse gas path being directly communicated with the concave cavity (11). Also disclosed is a vapor deposition method.

Inventors:
HU DONGDONG (CN)
LI NA (CN)
CHEN LU (CN)
XU KAIDONG (CN)
HOU YONGGANG (CN)
WANG CHENGYI (CN)
CHE DONGCHEN (CN)
SUN WEI (CN)
Application Number:
PCT/CN2018/106825
Publication Date:
June 27, 2019
Filing Date:
September 21, 2018
Export Citation:
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Assignee:
JIANGSU LEUVEN INSTRUMMENTS CO LTD (CN)
International Classes:
C23C16/50; C23C16/455
Foreign References:
CN108048820A2018-05-18
US5906683A1999-05-25
US6182602B12001-02-06
CN102420120A2012-04-18
CN103208440A2013-07-17
CN205258600U2016-05-25
CN205741208U2016-11-30
CN206089801U2017-04-12
Attorney, Agent or Firm:
BEIJING TRUSTED INTELLECTUAL PROPERTY AGENCY LTD (CN)
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