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Title:
VAPOR DEPOSITION DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/000490
Kind Code:
A1
Abstract:
A vapor deposition device, comprising a cavity (10), a first electrode (11), a second electrode (12), and an air inlet tube (13). An air inlet and an air outlet are provided on the cavity (10); the first electrode (11) and the second electrode (12) are provided in the cavity (10) and are respectively connected to a high frequency alternating current and grounded; the first electrode (11) is provided at the side where the air inlet is located, and the second electrode (12) is parallel to the first electrode (11) and is oppositely provided; the first electrode (11) comprises a first opening (111) facing the air inlet and a second opening (112) facing away from the air inlet and communicated with the first opening (111), and the air inlet tube (13) is introduced from the air inlet and connected to the first opening (111). The first electrode (11) has the first opening (111) communicated with the air inlet tube (13) and the second opening (112) for spraying gas. By externally connecting the first electrode (11) to the high frequency alternating current, introduced gas is sprayed out toward a gap between the first electrode (11) and the second electrode (12) without additionally designing a sprayer, so that the number of components and parts is reduced, and the volume of the device is also reduced.

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Inventors:
LIU FENGJU (CN)
Application Number:
PCT/CN2017/092660
Publication Date:
January 03, 2019
Filing Date:
July 12, 2017
Export Citation:
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Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
C23C16/455; C23C16/509
Foreign References:
TW201246368A2012-11-16
KR20070029356A2007-03-14
CN104789947A2015-07-22
CN101689450A2010-03-31
CN103107057A2013-05-15
Attorney, Agent or Firm:
MING & YUE INTELLECTUAL PROPERTY LAW FIRM (CN)
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