Title:
VAPOR DEPOSITION DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/100558
Kind Code:
A1
Abstract:
A vapor deposition device. The vapor deposition device comprises a crucible main body (201), a side surface heating device (202) disposed around the crucible main body (201), and a bottom heating device (203) disposed below the crucible main body (201). The bottom heating device (203) can move up and down in the height direction of the side surface heating device (202) and can support the crucible main body (201) to rise to a position higher than the side surface heating device (202). By arranging the heating device at the bottom, the crucible main body (201) can move up and down, thereby improving the maintenance efficiency, shortening the maintenance time, and reducing unnecessary working procedures.
Inventors:
TAN WEI (CN)
Application Number:
PCT/CN2018/072070
Publication Date:
May 31, 2019
Filing Date:
January 10, 2018
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
C23C14/24; H01L51/56
Foreign References:
CN104213080A | 2014-12-17 | |||
CN104603321A | 2015-05-06 | |||
CN104233197A | 2014-12-24 | |||
CN105441878A | 2016-03-30 | |||
CN106148899A | 2016-11-23 | |||
JP2007270261A | 2007-10-18 |
Attorney, Agent or Firm:
CHINA WISPRO INTELLECTUAL PROPERTY LLP. (CN)
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