Title:
VAPOR DEPOSITION MASK BASE, METHOD FOR INSPECTING VAPOR DEPOSITION MASK BASE, METHOD FOR PRODUCING VAPOR DEPOSITION MASK, AND METHOD FOR PRODUCING DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/033001
Kind Code:
A1
Abstract:
A vapor deposition mask base according to the present invention is used to produce a vapor deposition mask for forming an organic EL element. The vapor deposition mask base is formed from an alloy containing iron and nickel, contains particles formed from metal oxide, and has a thickness of 10-30 μm. A plurality of pinholes that pass through the vapor deposition mask base in the thickness direction are formed by etching of the front surface of the vapor deposition mask base. In a view from a viewpoint opposite from the front surface of the vapor deposition mask base, the maximum value of a line segment that connects two arbitrary points on the edge of each pinhole is 1-100 μm on the front surface. The number of pinholes located in each area of 100 cm2 on the front surface is 17 or less when the vapor deposition mask base is etched to a thickness of 5 μm, and is 90 or less when the vapor deposition mask base is etched to a thickness of 3 μm.
Inventors:
KUSUOKA RYOU (JP)
SHINNO MIKIO (JP)
SHINNO MIKIO (JP)
Application Number:
PCT/JP2022/032657
Publication Date:
March 09, 2023
Filing Date:
August 30, 2022
Export Citation:
Assignee:
TOPPAN INC (JP)
International Classes:
C23C14/04; C23C14/24; H05B33/10
Domestic Patent References:
| WO2019198263A1 | 2019-10-17 |
Foreign References:
| JP2017106114A | 2017-06-15 | |||
| JP2021038461A | 2021-03-11 |
Attorney, Agent or Firm:
ONDA Makoto et al. (JP)
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