Title:
VAPOR DEPOSITION MASK AND VAPOR DEPOSITION DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/180893
Kind Code:
A1
Abstract:
The objective of the invention is to form a notch section in a display area without causing a display defect. This vapor deposition mask (125) is used in the production of a display device (2) having a notch section (9) and comprises an FMM sheet (126) and a first cover sheet (127). The first cover sheet (127) comprises a trunk section (127a) and a notch-forming section (128) which protrudes from the trunk section (127a) so as to prevent film from being deposited in the notch section. The thickness of at least a portion of the notch-forming section (128) is smaller than the thickness of the trunk section (127a).
Inventors:
OHTA YOSHIFUMI
NISHIGUCHI MASAO
NISHIGUCHI MASAO
Application Number:
PCT/JP2018/011509
Publication Date:
September 26, 2019
Filing Date:
March 22, 2018
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
H05B33/10; C23C14/04; G09F9/00; G09F9/30; H01L27/32; H01L51/50
Domestic Patent References:
| WO2016129534A1 | 2016-08-18 |
Foreign References:
| CN107740065A | 2018-02-27 | |||
| JP2015069806A | 2015-04-13 |
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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