VAPOR DEPOSITION MASK, MANUFACTURING METHOD THEREOF, AND MANUFACTURING METHOD FOR ORGANIC LIGHT-EMITTING DIODE USING VAPOR DEPOSITION MASK

WIPO Patent Application WO/2017/130440

A1

Provided is a vapor deposition mask used to form a thin film pattern on a substrate, whereby it becomes possible to: prevent the generation by a retaining member of a shadow part (vapor deposition shadow) in which a vapor deposition substance does not adhere; form a more high definition thin film pattern; and furthermore, make it possible to be strongly sucked and held so as to be closely adhered to a surface of a transparent substrate by a magnet with the substrate retained by a substrate holder therebetween. A vapor deposition mask 1 is constituted of a unit of a resin film layer 2 or of the resin film layer 2 and a retaining member 7 which is a thin plate-like frame body of a substantially rectangular shape, and a magnetic metal powder 4 is contained in the resin layer film 2 in which a plurality of through-openings 3 are formed. When the retaining member 7 is included, formed in the retaining member 7 is a single rectangular opening 8 including the portion of the resin layer film 2 in which the plurality of through-openings 3 have been formed.

JP2023073995	MASK DRIER
JP2022066709	VAPOR DEPOSITION MASK AND METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK
JP2015175024	THIN FILM DEPOSITION APPARATUS

NISHIDA KOSHI (JP)
YANO KOZO (JP)
KISHIMOTO KATSUHIKO (JP)

PCT/JP2016/071853

August 03, 2017

July 26, 2016

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HON HAI PREC IND CO LTD (TW)

C23C14/04; H01L51/50; H05B33/10

WO2016063810A1

2016-04-28

JP2014201819A	2014-10-27
JPH11214154A	1999-08-06
JP2005302457A	2005-10-27
JP2005519187A	2005-06-30
JP2013209710A	2013-10-10

ITAYA, Yasuo (JP)

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