Title:
VAPOR DEPOSITION MASK MANUFACTURING METHOD, VAPOR DEPOSITION MASK-ALLOCATED INTERMEDIATE PRODUCT, AND VAPOR DEPOSITION MASK
Document Type and Number:
WIPO Patent Application WO/2018/066325
Kind Code:
A1
Abstract:
[Problem] The present invention addresses the problem of manufacturing a vapor deposition mask wherein deformation of long sides is suppressed.
[Solution] This vapor deposition mask manufacturing method is provided with: a step for preparing a metal plate; a processing step for processing the metal plate into an intermediate product that is provided with a plurality of vapor deposition mask portions, which include a pair of long sides and a pair of short sides, and in which a plurality of through holes are formed, and a supporting portion, which surrounds the vapor deposition mask portions, and which is partially connected to the short sides of the vapor deposition mask portions; and a separating step for obtaining vapor deposition masks by separating the vapor deposition mask portions from the supporting portion. In the intermediate product, the long sides of the vapor deposition mask portions are not connected to the supporting portion.
Inventors:
IKENAGA CHIKAO (JP)
MARUOKA TAKANORI (JP)
MATSUURA SACHIYO (JP)
MARUOKA TAKANORI (JP)
MATSUURA SACHIYO (JP)
Application Number:
PCT/JP2017/032923
Publication Date:
April 12, 2018
Filing Date:
September 12, 2017
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD (JP)
International Classes:
C23C14/04; C23F1/00; H01L51/50; H05B33/10; C23F1/02
Foreign References:
| US20150013601A1 | 2015-01-15 | |||
| US20160144393A1 | 2016-05-26 | |||
| JP2016148111A | 2016-08-18 |
Other References:
See also references of EP 3524710A4
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
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