Title:
VAPOR DEPOSITION MASK, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK DEVICE, AND METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK
Document Type and Number:
WIPO Patent Application WO/2018/131474
Kind Code:
A1
Abstract:
Provided is a vapor deposition mask such that, letting X1 be a dimension from point P1 to point Q1, X2 a dimension from point P2 to point Q2, and αx a prescribed value, (AA) and (BB) are satisfied.
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Inventors:
IKENAGA CHIKAO (JP)
Application Number:
PCT/JP2017/046751
Publication Date:
July 19, 2018
Filing Date:
December 26, 2017
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD (JP)
International Classes:
C23C14/04; C23C14/12; H01L51/50; H05B33/10
Foreign References:
JP2014148743A | 2014-08-21 | |||
JP2016053192A | 2016-04-14 |
Other References:
See also references of EP 3569730A4
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
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