Title:
VAPOR DEPOSITION MASK
Document Type and Number:
WIPO Patent Application WO/2020/044547
Kind Code:
A1
Abstract:
A vapor mask (10) has a mask sheet (15) that includes: a plurality of vapor deposition holes (H) that are provided for each pixel (pix) on a substrate to be subjected to vapor deposition that is provided with an active region (3) that has arrayed therein the pixels; and a slit section provided so as to correspond to a different-shape section in the active region. A shielding section (25) having a greater width (P2) than the pitch (P1) between adjacent vapor deposition holes (H) is formed between slits (SL) of the slit section and the vapor deposition holes.
Inventors:
YANG YIXIN
Application Number:
PCT/JP2018/032399
Publication Date:
March 05, 2020
Filing Date:
August 31, 2018
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
C23C14/04; C23C14/24; H01L51/50; H05B33/10
Foreign References:
| JP2017210657A | 2017-11-30 | |||
| JP2015103427A | 2015-06-04 | |||
| JP2004296436A | 2004-10-21 | |||
| CN104846328A | 2015-08-19 | |||
| US20110157575A1 | 2011-06-30 |
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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