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Patent Searching and Data


Title:
VAPOR DEPOSITION MATERIAL AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2021/020223
Kind Code:
A1
Abstract:
A vapor-deposited member characterized in that a vapor deposition material thereof comprises any one or more of Au, Ag, Pt, Pd, and an alloy thereof, the vapor-deposited member has micropores in the surface of the vapor-deposited member, and the number of micropores having a circle equivalent diameter of 0.1 µm to 10.0 µm per 500 µm2 is 1 or more. A vapor-deposited member characterized in that the hydrogen content in the vapor-deposited member is 10 wtppm or less. The present invention addresses the problem of providing a vapor deposition material used in a vacuum vapor deposition method, wherein explosive boiling during melting of the vapor deposition material can be suppressed.

Inventors:
TAKADA EIJI (JP)
KOBAYASHI TAKAHIRO (JP)
NAKANO YUKITAKE (JP)
NAKAGOSHI SHUJI (JP)
SHIOTA TATSUYA (JP)
Application Number:
PCT/JP2020/028192
Publication Date:
February 04, 2021
Filing Date:
July 21, 2020
Export Citation:
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Assignee:
MATSUDA SANGYO COMPANY LTD (JP)
YAMAKIN CO LTD (JP)
International Classes:
C23C14/24; C22C5/02; C22C5/04; C22C5/06; C23C14/06
Foreign References:
JPH05339708A1993-12-21
JP2002275561A2002-09-25
JP2018123389A2018-08-09
JPS63135780A1988-06-08
JPH06279992A1994-10-04
Attorney, Agent or Firm:
OGOSHI Kazuteru et al. (JP)
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