Title:
VAPOR DEPOSITION METHOD AND VAPOR DEPOSITION DEVICE
Document Type and Number:
WIPO Patent Application WO2017010512
Kind Code:
A1
Abstract:
Limiting nozzles (61a1-61c6) for limiting directionality in an in-plane direction of first through third vapor deposition particles (91a, 91b, 91c) emitted toward a substrate (10) from first through third vapor deposition source openings are provided in the first through third vapor deposition source openings (61a, 61b, 61c).
Inventors:
OCHI TAKASHI
KAWATO SHINICHI
MATSUNAGA KAZUKI
KOBAYASHI YUHKI
KIKUCHI KATSUHIRO
ICHIHARA MASAHIRO (JP)
KAWATO SHINICHI
MATSUNAGA KAZUKI
KOBAYASHI YUHKI
KIKUCHI KATSUHIRO
ICHIHARA MASAHIRO (JP)
Application Number:
PCT/JP2016/070682
Publication Date:
January 19, 2017
Filing Date:
July 13, 2016
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
C23C14/24; C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
| WO2012098927A1 | 2012-07-26 | |||
| WO2012172883A1 | 2012-12-20 |
Foreign References:
| JP2015034308A | 2015-02-19 | |||
| JP2005293968A | 2005-10-20 | |||
| JP2011233521A | 2011-11-17 |
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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