Title:
VAPOR DEPOSITION PARTICLE EMITTING DEVICE, VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD
Document Type and Number:
WIPO Patent Application WO/2012/124563
Kind Code:
A1
Abstract:
A vapor deposition particle emitting device (30) is provided with a hollow rotating body (40) on which first and second nozzle parts (50, 60) are disposed, a rotation mechanism, and heat exchangers (52, 62). When the rotating body (40) is rotated by the rotation mechanism, the heat exchangers (52, 62) switch between cooling and heating according to the positions of the nozzle parts in such a manner that the externally-facing nozzle part drops below the temperature at which the vapor deposition material becomes a gas, and the other nozzle part reaches a temperature that is greater than or equal to the temperature at which the vapor deposition becomes a gas.
Inventors:
INOUE SATOSHI
KAWATO SHINICHI
SONODA TOHRU
KAWATO SHINICHI
SONODA TOHRU
Application Number:
PCT/JP2012/055800
Publication Date:
September 20, 2012
Filing Date:
March 07, 2012
Export Citation:
Assignee:
SHARP KK (JP)
INOUE SATOSHI
KAWATO SHINICHI
SONODA TOHRU
INOUE SATOSHI
KAWATO SHINICHI
SONODA TOHRU
International Classes:
C23C14/24; H01L51/50; H05B33/10
Foreign References:
| JP2004137583A | 2004-05-13 | |||
| JPH11100663A | 1999-04-13 | |||
| JP2011047035A | 2011-03-10 |
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
Patent business corporation Hara [Kenzo] international patent firm (JP)
Patent business corporation Hara [Kenzo] international patent firm (JP)
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