Title:
VAPOR DEPOSITION SOURCE, VAPOR DEPOSITION DEVICE, AND METHOD FOR MANUFACTURING VAPOR DEPOSITION FILM
Document Type and Number:
WIPO Patent Application WO/2019/064426
Kind Code:
A1
Abstract:
A vapor deposition source (1) is provided with an accommodating part (2) for accommodating vapor deposition particles (11), and a plurality of nozzles (3) arranged in a line along an X-axis direction, the plurality of nozzles at end parts in the X-axis direction of the accommodating part protruding in an oblique direction toward the end parts in the X-axis direction, the arrangement density of the nozzles in the end parts in the X-axis direction of the accommodating part being greater than the arrangement density of nozzles in a center part of the accommodating part, and a line (L2) connecting top end surfaces (32) of adjacent nozzles in the end parts in the X-axis direction of the accommodating part being a straight line.
Inventors:
NISHIGUCHI MASAO
Application Number:
PCT/JP2017/035217
Publication Date:
April 04, 2019
Filing Date:
September 28, 2017
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
C23C14/24; H01L51/50; H05B33/10
Foreign References:
| JP2014201834A | 2014-10-27 | |||
| JP2016125091A | 2016-07-11 | |||
| KR20060101987A | 2006-09-27 |
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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