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Title:
VAPOR-PHASE GROWTH APPARATUS, METHOD FOR PRODUCTION OF EPITAXIAL WAFER, AND ATTACHMENT FOR VAPOR-PHASE GROWTH APPARATUS
Document Type and Number:
WIPO Patent Application WO/2018/042877
Kind Code:
A1
Abstract:
A vapor-phase growth apparatus 1 is provided with: a reaction furnace 2; multiple flow channels 16a; a cap 14; and an attachment 15. The reaction furnace 2 has an entrance 8a through which a vapor-phase growth gas is introduced, and uses the vapor-phase growth gas to grow an epitaxial layer on a substrate W. The multiple flow channels 16a extend from the entrance 8a to the outside of the entrance 8a, and introduce the vapor-phase growth gas into the reaction furnace 2. The cap 14 has an introduction channel 14a that is for introducing gas material toward the multiple flow channels 16a. The attachment 15 has a branch channel 15a that is connectable to the introduction channel 14a, and is mounted to the cap 14. The branch channel 15a is connected to the introduction channel 14a when the attachment 15 is mounted to the cap 14, and is configured to branch out in a knockout tournament draw pattern so as to correspond to the multiple flow channels 16a, from the introduction channel 14a side downstream toward the direction of the gas material so as to be connected to the respective flow channels 16a. This configuration provides a vapor-phase growth apparatus that enables improvement of, in a cost effective manner, the uniformity in film thickness of an epitaxial layer to be grown on a substrate.

Inventors:
OHNISHI, Masato (Shirakawa Plant, 150, Aza Ohira, Oaza Odakura, Nishigo-mura, Nishishirakawa-gu, Fukushima 61, 〒9618061, JP)
Application Number:
JP2017/024822
Publication Date:
March 08, 2018
Filing Date:
July 06, 2017
Export Citation:
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Assignee:
SHIN-ETSU HANDOTAI CO.,LTD. (2-1 Ohtemachi 2-chome, Chiyoda-ku Tokyo, 04, 〒1000004, JP)
International Classes:
H01L21/205; C23C16/455
Foreign References:
JP2011249448A2011-12-08
JP2011023563A2011-02-03
JP2005353775A2005-12-22
JP2005183511A2005-07-07
JP2002075692A2002-03-15
JP2004127853A2004-04-22
Attorney, Agent or Firm:
HARIKAWA, Takashi (SUGAWARA & ASSOCIATES, Sakae Yamakichi Bldg. 9-30, Sakae 2-chome, Naka-ku, Nagoya-sh, Aichi 08, 〒4600008, JP)
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